- -18%
Two-phase formula for effective, yet gentle make-up removal
The formula with Centella Asiatica extract was created for sensitive, reactive and redness-prone skin.
A specialized skincare treatment combining the benefits of a mask and a concentrated ampoule. The formula with Centella Asiatica extract was created for sensitive, reactive, and redness-prone skin. The mask helps soothe the skin, reduce the appearance of irritation, and restore comfort and balance. Thanks to the lightweight, impregnated sheet, active ingredients can effectively support skincare needs for delicate skin.
ACTION
✔ Helps reduce the appearance of skin redness
✔ Soothes and relieves discomfort
✔ Supports regeneration and rebuilding of the skin's protective barrier
✔ Intensively moisturizes and improves skin comfort
EFFECT
✔ The skin si calmer and more comfortable
✔ Redness is less visible
✔ The complexion looks healthier and more rested
✔ The skin is soft, moisturized and pleasant to the touch
ACTIVE INGREDIENTS
✔ Centella Asiatica – soothes, supports regeneration and helps improve the condition of sensitive skin
✔ Panthenol – soothes irritations and supports epidermal renewal processes
✔ Hyaluronic acid – intensely moisturizes and helps maintain the appropriate moisture level
✔ Allantoin – soothes and supports skin comfort
FOR WHOM
✔ For people with sensitive skin prone to redness
✔ For reactive skin that needs soothing
✔ For those looking for intensive regenerative care
✔ For anyone who wants to quickly improve the comfort and appearance of their skin
Cleanse your face and gently pat it dry. Remove the mask from the packaging and adjust it to the shape of your face. Leave on for 15–20 minutes. After removing the mask, gently pat any remaining essence into your skin. Do not rinse.
Aqua , Glycerin, Centella Asiatica Extract, Sodium Hyaluronate, Panthenol , Betaine, Allantoin, Propanediol, Carbomer, Triethanolamine, Phenoxyethanol, Ethylhexylglycerin, Parfum
(Composition subject to change. The current composition can be found on the product packaging.)
FAQ – FREQUENTLY ASKED QUESTIONS
✔ Is the mask suitable for sensitive skin?
Yes. The formula with Centella Asiatica was developed for skin that requires soothing and gentle care.
✔ Does the mask help reduce redness?
Yes. Soothing ingredients help improve skin's appearance and reduce the appearance of redness.
✔ Should I wash my face after using the mask?
No. The remaining essence should be gently patted into the skin and left to absorb.
✔ How often can the mask be used?
The mask can be used 1-2 times a week or whenever the skin needs additional relief and regeneration.
Two-phase formula for effective, yet gentle make-up removal
A gentle toothpaste designed for the daily care of sensitive teeth and gums.
Diaper rash cream protects and soothes from the first day of life, regenerates the skin, soothes irritations and supports the protective barrier thanks to natural oils
Tonic restores the skin's natural pH.
Conditioner, hardener and nail polish in one with argan oil, pea proteins and vitamin E, strengthens, brightens, protects and gives a pastel pink, can be used alone or as a base for nail polish
The product refreshes the color, giving the hair a captivating creamy shade, a pearly shade of milky foam
check_circle
check_circle